Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching.
作者： Maho Kobayashi , Kyoka Susuki , Tomohiro Otani , Shinpei Enomoto , Haruo Otsuji
DOI: 10.1039/C7NR01560G
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摘要: The thickness of 3-dimensional (3D) mesoporous silica ultrathin films was controlled at a single-nanometer scale by wet-etching. A drop casting method with an aqueous etchant ammonium fluoride effective in etching the surfaces direction perpendicular to their substrates. decrease film depends on interface tension solutions. wettability thin also influences etching. CoPt nanodots were electrodeposited within Ru substrates form nanodot patterns.
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