Effects of nitrogen incorporation on structure of a-C:H films deposited on polycarbonate by plasma CVD

摘要: Abstract Nitrogen-incorporated-hydrogenated amorphous carbon (a-C:H:N) films were deposited on polycarbonate (PC) substrates by r.f. plasma-enhanced chemical vapor deposition (PECVD). Effects of nitrogen incorporation microstructure, bonding states, composition, internal stresses, and friction coefficients investigated. The characterized X-ray photoelectron microscopy, infrared microscopy (IR), Raman spectroscopy tests. Results from the measurement indicate that incorporated content has considerable effects film properties. spectra a-C:H:N are broad, asymmetric centered at around wavenumber 1500 cm −1 . Shifting G-peak toward higher wavenumber, narrower bandwidth an increase I D / G ratio demonstrate graphitic character with further atomic fraction (N/C). IR bonded to hydrogen as C N, N–H C–H configurations in films. stress considerably decreased well coefficient is low when N/C increased. surface roughness estimated force (AFM) seems be less smooth fraction.