Alternate method for photodiode formation in CMOS image sensors

作者: Robert M. Guidash

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摘要: A complementary metal oxide semiconductor (CMOS) active pixel sensor (APS) having a plurality of pixels which includes at least one entailing photodetector, transistor adjacent the photodetector silicide surface, and an insulator over photodetector. The has thickness sufficient to prevent surface from forming contains as field oxide.

参考文章(26)
El-Sayed Ibrarhim Eid, David Andrew Inglis, Alexander George Dickinson, Active pixel sensor and imaging system having differential mode ,(1995)
Eric R. Fossum, Jon H. Bechtel, Joseph S. Stam, Sabrina E. Kemeny, Wide dynamic range optical sensor ,(1998)
F. Andoh, K. Taketoshi, J. Yamazaki, M. Sugawara, Y. Fujita, K. Mitani, Y. Matuzawa, K. Miyata, S. Araki, A 250000-pixel image sensor with FET amplification at each pixel for high-speed television cameras international solid-state circuits conference. ,vol. 33, pp. 212- 213 ,(1990) , 10.1109/ISSCC.1990.110200
Mark A. Beiley, Edward J. Bawolek, Eric J. Hoffman, Bart Mcdaniel, Lawrence T. Clark, A well to substrate photodiode for use in a cmos sensor on a salicide process ,(1998)