作者: A.I. Ali , A.H. Ammar , A. Abdel Moez
DOI: 10.1016/J.SPMI.2013.11.007
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摘要: Abstract A Radio Frequency (RF) technique was used to prepare ZnO thin films with different substrate temperature under ultra high vacuum. Structure results revealed that these have crystalline structure. The structure of carried out using X-ray Diffraction and Atomic Force Electron Microscope (AFM). grain size for were determined AFM photos. optical parameters such as, energy gap, refractive index, extinction coefficient, dielectric loss tangent determined. Another important as dispersion energy, oscillating the ratio between free carrier concentration/effective mass (N/m*) optically. It found that, investigated plays an rule changing films.