Inclined nanoimprinting lithography-based 3D nanofabrication
作者： Zhan Liu , David G Bucknall , Mark G Allen
DOI: 10.1088/0960-1317/21/6/065036
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摘要: We report a 'top–down' 3D nanofabrication approach combining non-conventional inclined nanoimprint lithography (INIL) with reactive ion etching (RIE), contact molding and metal nanotransfer printing (nTP). This integration of processes enables the production conformal transfer polymer nanostructures varying heights to variety other materials including silicon-based substrate, silicone stamp gold (Au) thin film. The process demonstrates potential reduced fabrication cost complexity compared existing methods. Various in technologically useful have been fabricated, symmetric asymmetric nanolines, nanocircles nanosquares. Such applications such as angle-resolved photonic crystals, plasmonic crystals biomimicking anisotropic surfaces. integrated INIL-based strategy shows great promise for fields photonics, plasmonics surface tribology.
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