作者: Reza Ebrahimifard , Mohammad Reza Golobostanfard , Hossein Abdizadeh
DOI: 10.1016/J.APSUSC.2013.11.062
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摘要: Abstract Al and Ga co-doped ZnO (AGZO) thin films with different doping contents of 0.5–4 at.% were synthesized via sol–gel route using dip coating method the results compared to single doped specimens Al:ZnO (AZO) Ga:ZnO (GZO). All samples highly transparent in visible region (T > 85%) band gap values around 3.3 eV. Introduction crystal structure decreased crystallinity reduced particle size films. Electrical resistivity was investigated engineered this study as main parameter. Single showed reduction un-doped ZnO. In regard, more efficient than decreasing electrical resistivity. Furthermore, 1 at.% minimum amount Co-doping performed two approaches including variable content (Al + Ga ≠ cte) constant (Al + Ga = 0.5, 1, 2 at.%) for sake comparison samples. Samples Al = 1 at.% Ga = 1 at.% lowest AGZO former approach. However, latter approach obtained Al + Ga = 2 at.% sample. The proved capability optoelectronic industry regarding partially substitution expensive obtaining conductive lower conventional AZO also achieving commercial advantages costly GZO