Systems and methods for semiconductor device process determination using reflectivity measurement
作者： Sheng-Wen Yu , De-Wei Yu , Chun Hsiung Tsai
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摘要: Methods and systems that include receiving a plurality of reflectivity measurements on semiconductor wafer. A map is generated based the received measurements. The used to determine process parameter an epitaxial growth using map. In embodiment, power setting (heating) lamp CVD epitaxy tool.
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