Synthesis of nano-crystalline germanium carbide using radio frequency magnetron sputtering

作者: Neeti Gupta , Binesh Puthen Veettil , Hongze Xia , Siva Krishna Karuturi , Gavin Conibeer

DOI: 10.1016/J.TSF.2015.09.014

关键词:

摘要: Abstract Nano-crystalline Ge x C 1 − x is a potential third generation solar cell absorber material due to its favourable opto-electronic properties and relatively high abundance of elements. The ability grow nano-crystalline in large areas by an industry-friendly process can enhance scope as photovoltaic absorber. In this work thin films have been grown on Si (100) substrate using radio frequency magnetron sputtering. crystallinity, composition, structure optical the were determined by, X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, atomic force microscopy, transmission electron microscopy (TEM) ultra-violet visible infrared spectroscopy. From TEM results it was found that crystals scattered film with d-spacing 3.4 nm between fringes (calculated a = 5.53 A), but small number nanoparticles GeC present. signature local Ge–C mode identified near 530 cm − 1 at 350 °C. band gap energy value estimated be 0.90 eV from reflectance spectra. Maximum 15.5% deposited 350 °C XPS fitting.

参考文章(39)
R. J. Soukup, J. L. Huguenin-Love, N. J. Ianno, D. W. Thompson, Experimental studies of Ge1−xCx and Ge1−x−yCxAly thin films Journal of Vacuum Science and Technology. ,vol. 26, pp. 17- 22 ,(2008) , 10.1116/1.2805244
Zhan Chang-Yong, Wang Li-Wu, Huang Ning-Kang, Effect of Bias on Content of GeC in Ge 1-x C x Films Chinese Physics Letters. ,vol. 24, pp. 803- 806 ,(2007) , 10.1088/0256-307X/24/3/060
R. E. Sah, Ch. Wild, Peter Koidl, H. Baumann, Amorphous hydrogenated carbon germanium films for hard multilayer IR optical coatings The Hague '90, 12-16 April. ,vol. 1275, pp. 59- 65 ,(1990) , 10.1117/12.20517
R. I. Scace, G. A. Slack, Solubility of Carbon in Silicon and Germanium The Journal of Chemical Physics. ,vol. 30, pp. 1551- 1555 ,(1959) , 10.1063/1.1730236
C.N. Zoita, C.E.A. Grigorescu, I.C. Vasiliu, I.D. Feraru, Influence of process parameters on structure and optical properties of GeC thin films deposited by RF magnetron sputtering Thin Solid Films. ,vol. 519, pp. 4101- 4104 ,(2011) , 10.1016/J.TSF.2011.01.204
H.J. Osten, E. Bugiel, P. Zaumseil, Antimony-mediated growth of epitaxial Ge1−yCy layers on Si(001) Journal of Crystal Growth. ,vol. 142, pp. 322- 326 ,(1994) , 10.1016/0022-0248(94)90339-5
M. Todd, J. Kouvetakis, David J. Smith, Synthesis and characterization of heteroepitaxial diamond‐structured Ge1−xCx (x=1.5–5.0%) alloys using chemical vapor deposition Applied Physics Letters. ,vol. 68, pp. 2407- 2409 ,(1996) , 10.1063/1.116149
M. P. Hernández, M. H. Farías, F. F. Castillón, A. Díaz, Jesús, M. Avalos, L. Ulloa, J. A. Gallegos, H. Yee-Madeira, Growth and characterization of polycrystalline Ge1−xCx by reactive pulsed laser deposition Applied Surface Science. ,vol. 257, pp. 5007- 5011 ,(2011) , 10.1016/J.APSUSC.2011.01.011