Surface characterization of diamond film tool grinding on the monocrystal sapphire under different liquid environments

作者: Wei Feng , Wenzhuang Lu , Hai Zhou , Bin Yang , Dunwen Zuo

DOI: 10.1016/J.APSUSC.2016.06.191

关键词:

摘要: Surface characterization of diamond film tool on the monocrystal sapphire under H 2 O, 3% ethylene glycol and 3% ethylenediamine was investigated. The typical components and chemical changes of the surface of diamond thick film were studied by means of Raman and XPS. Results showed that tribological properties of diamond film tool were associated with the liquid environment located the grinding. Diamond film tool under 3% ethylenediamine solution exhibited the minimum value of friction coefficient, while that under H 2 O exhibited …

参考文章(18)
Z C Li, Z J Pei, P D Funkenbusch, Machining processes for sapphire wafers: a literature review Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture. ,vol. 225, pp. 975- 989 ,(2011) , 10.1177/2041297510393667
Sajan. Thomas, Peter M. A. Sherwood, Valence band spectra of aluminum oxides, hydroxides, and oxyhydroxides interpreted by X.alpha. calculations Analytical Chemistry. ,vol. 64, pp. 2488- 2495 ,(1992) , 10.1021/AC00045A006
Frederik Klauser, Doris Steinmüller-Nethl, Reinhard Kaindl, Erminald Bertel, Norbert Memmel, Raman Studies of Nano‐ and Ultra‐nanocrystalline Diamond Films Grown by Hot‐Filament CVD Chemical Vapor Deposition. ,vol. 16, pp. 127- 135 ,(2010) , 10.1002/CVDE.200906827
T.S. Sudarshan, R. Radhakrishnan, Polishing techniques for optical grade sapphire Materials Science and Technology. ,vol. 16, pp. 958- 960 ,(2000) , 10.1179/026708300101508892
Chuljin Park, Hyoungjae Kim, Sangjik Lee, Haedo Jeong, The influence of abrasive size on high-pressure chemical mechanical polishing of sapphire wafer International Journal of Precision Engineering and Manufacturing-Green Technology. ,vol. 2, pp. 157- 162 ,(2015) , 10.1007/S40684-015-0020-0
J. Borges, C. Fonseca, N.P. Barradas, E. Alves, T. Girardeau, F. Paumier, F. Vaz, L. Marques, Influence of composition, bonding characteristics and microstructure on the electrochemical and optical stability of AlOxNy thin films Electrochimica Acta. ,vol. 106, pp. 23- 34 ,(2013) , 10.1016/J.ELECTACTA.2013.05.020
Honglin Zhu, Luiz A. Tessaroto, Robert Sabia, Victor A. Greenhut, Maynard Smith, Dale E. Niesz, Chemical mechanical polishing (CMP) anisotropy in sapphire Applied Surface Science. ,vol. 236, pp. 120- 130 ,(2004) , 10.1016/J.APSUSC.2004.04.027
Paranjayee Mandal, Arutiun P. Ehiasarian, Papken Eh. Hovsepian, Lubricated sliding wear mechanism of chromium-doped graphite-like carbon coating Tribology International. ,vol. 77, pp. 186- 195 ,(2014) , 10.1016/J.TRIBOINT.2014.04.007
Li Xu, Chunli Zou, Xiaolei Shi, Guoshun Pan, Guihai Luo, Yan Zhou, Fe-Nx/C assisted chemical-mechanical polishing for improving the removal rate of sapphire Applied Surface Science. ,vol. 343, pp. 115- 120 ,(2015) , 10.1016/J.APSUSC.2015.03.041
Aric B. Shorey, Stephen D. Jacobs, William I. Kordonski, Roger F. Gans, Experiments and observations regarding the mechanisms of glass removal in magnetorheological finishing Applied Optics. ,vol. 40, pp. 20- 33 ,(2001) , 10.1364/AO.40.000020