Halogen assisted volatilization in electrothermal atomic absorption spectroscopy: reduction of memory effects from refractory carbides
作者： J.P. Matousek , H.K.J. Powell
DOI: 10.1016/0584-8547(86)80010-6
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摘要: Abstract Memory (carry-over) effects associated with electrothermal atomic absorption spectroscopic (ETAAS) analysis of metals which form refractory carbides can be overcome by a halogen (Cl 2 ) purging process. Residual are removed from the graphite or pyrolytic graphite-coated furnaces after each analysis, group analyses, injection Cl into heated furnace. Alternatively, may injected during atomization step immediately maximum is observed, thus avoiding separate heating/purging cycle. The application this method to determination V and Cr reported. Optimum temperatures were established for volatilization residual prepared in situ . results supported thermodynamic calculations.
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