作者:
DOI: 10.5012/BKCS.2005.26.3.418
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摘要: By introducing spin-coating method to the evaporation induced self-assembly (EISA) process, a simple and reproducible route in controlling mesophase of silica thin films has been developed for first time this work. When comparatively solvent-rich Si-sol (The atomic ratio TEOS : F127 HCl H2O EtOH = 1 0.006 0.2 9.2 30) was used as coating solution, resultant selectively controlled by adjusting spin-on speed. The cubic obtained from at low rpm, such 600 while 2-D hexagonal is formed high 2,500 rpm. At medium speed, mixture found fabricated films. present results confirm that rate volatile components initial step critical determination mesopore structures during EISA process.