Block Copolymer Lithography
作者： Christopher M. Bates , Michael J. Maher , Dustin W. Janes , Christopher J. Ellison , C. Grant Willson
DOI: 10.1021/MA401762N
关键词:
摘要: This Perspective addresses the current state of block copolymer lithography and identifies key challenges opportunities within field. Significant strides in experimental theoretical thin film research have nucleated transition copolymers “from lab to fab”, but outstanding questions remain about optimal materials, processes, analytical techniques for first-generation devices beyond. Particular attention herein is focused on advances issues related thermal annealing. Block are poised change traditional lithographic resolution enhancement paradigm from “top-down” “bottom-up”.
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