Growth and Characterization of Homoepitaxial ZnO Thin Films Grown by CVD

作者: Christian Neumann , Joachim Sann , Stefan Lautenschläger , Frank Bertram , Jürgen Christen

DOI: 10.1557/PROC-0957-K05-03

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摘要: ZnO as a direct wide-band-semiconductor with its band gap of 3.3 eV at room temperature is promising optoelectronic material. The main obstacle in the system lack achieving reproducible p-type conductivity. reasons for this are high residual intrinsic and extrinsic defect concentrations which still not completely understood. Homoepitaxial growth thus minimization defects due to lattice mismatch incorporation substrate species could be solution overcome these problems. Despite availability bulk single crystals reports regarding homoepitaxy quite rare. In paper we report on successful homoepitaxial thin films by chemical vapor deposition (CVD). Atomic force microscopy shows that two-dimensional epitaxial was achieved without any additional buffer layer. With rocking curve full width half maximum (FWHM) 17 arcsec deposited show superior crystalline quality compared substrate. optical has been characterized laterally cathodoluminescence spectrally photoluminescence. Excitonic emissions 4K narrow 110 μeV. A dependence appearance excitonic from polarity can shown attributed different rates defects.

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