Photoresist compositions and methods
作者： Joshua Kaitz , Tomas Marangoni , AQAD Emad , Amy M Kwok , Mingqi Li
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摘要: New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise:(a) a first matrix polymer;(b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).
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