引用次数
引用: 10,648
H-指数: 42
I10-指数 : 97
出版物: 177
Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
EP Gusev , E Cartier , DA Buchanan , M Gribelyuk
Microelectronic Engineering 59 ( 1) 341 -349
346
2001
Work Function Tuning of MoxSiyNz metal gate electrode for Advanced CMOS Technology
Pommy Patel , Douglas A Buchanan , Robert M Wallace
MRS Proceedings 1073 ( 1) 1 -5
2008
Semiconductor device structures (gate stacks) with charge compositions
Douglas A Buchanan , Eduard A Cartier , Kevin K Chan , Leland Chang
23
2008
CMOS scaling into the 21st century: 0.1 µm and beyond
Yuan Taur , Y-J Mii , David J Frank , H-S Wong
IBM Journal of Research and Development 39 ( 1.2) 245 -260
186
1995
Precursor source mixtures
Douglas A Buchanan , Deborah Ann Neumayer
594
2006
Diamond-like carbon films from a hydrocarbon helium plasma
Fredric D Bailey , Douglas A Buchanan , Alessandro C Callegari , Howard M Clearfield
308
1995
Interfacial oxidation process for high-k gate dielectric process integration
Arne W Ballantine , Douglas A Buchanan , Eduard A Cartier , Kevin K Chan
149
2002
Process options of forming silicided metal gates for advanced CMOS devices
Ricky S Amos , Douglas A Buchanan , Cyril Cabral Jr , Evgeni P Gousev
80
2006
High mobility FETS using Al203 as a gate oxide
Douglas A Buchanan , Alessandro C Callegari , Michael A Gribelyuk , Paul C Jamison
66
2003
Process options of forming silicided metal gates for advanced CMOS devices
Ricky S Amos , Douglas A Buchanan , Cyril Cabral Jr , Evgeni P Gousev
63
2008
High-dielectric constant insulators for FEOL capacitors
Arne W Ballantine , Douglas A Buchanan , Eduard A Cartier , Douglas D Coolbaugh
38
2003
Method for etching chemically inert metal oxides
Douglas A Buchanan , Eduard A Cartier , Evgeni Gousev , Harald Okorn-Schmidt
33
2011
Capacitive micromachined ultrasonic transducer with multiple deflectable membranes
Tahereh Arezoo Emadi , Douglas A Buchanan
26
2018
MOS device having a passivated semiconductor-dielectric interface
Paul M Solomon , Douglas A Buchanan , Eduard A Cartier , Kathryn W Guarini
21
2003
Apparatus and method for forming an oxynitride insulating layer on a semiconductor wafer
Douglas A Buchanan , Evgeni P Gousev , Carol J Heenan , Wade J Hodge
12
2005
Design, development, and characterization of a low frequency CMUT-based anemometer
Mayank B Thacker , Arezoo Emadi , Douglas A Buchanan
IEEE Access 9 127735 -127741
9
2021
Process for passivating the semiconductor-dielectric interface of a MOS device and MOS device formed thereby
Paul M Solomon , Douglas A Buchanan , Eduard A Cartier , Kathryn W Guarini
8
2004
High-dielectric constant insulators for feol capacitors
Evgeni P Gousev , Harald F Okorn-Schmidt , Arne W Ballantine , Douglas A Buchanan
6
2005
SYMPOSIUM T
Douglas A Buchanan , Arthur H Edwards , Takeo Hattori , Hans Jurgen von Bardeleben
4
1948
High temperature processing compatible metal gate electrode for pFETS and methods for fabrication
Ricky Amos , Douglas A Buchanan , Cyril Cabral Jr , Alessandro C Callegari
3
2011
Eduard A Cartier Matt Copel Harald Okorn-Schmidt (HF Schmidt) Supratik Guha Arezoo Emadi James Stathis Lars-Åke Ragnarsson David J Frank Farhan Rana douglas thomson Sufi Zafar K Rim Naftali E. Lustig Stephen A. Campbell Fuad E. Doany Andrew Pomerene H.-S. Philip Wong Massimo V Fischetti Arvind Kumar Thomas N. Jackson