Methods of forming gate structures of semiconductor devices
Kim Hoon , Park Chanro , Sung Min Gyu
1
2015
METHODS OF FORMING SELF-ALIGNED CONTACT STRUCTURES BY WORK FUNCTION MATERIAL LAYER RECESSING AND THE RESULTING DEVICES
Park Chanro , Kim Hoon , Sung Min Gyu , Xie Ruilong
7
2017
Dual mandrels to enable variable fin pitch
Park Chanro , Sung Min Gyu , Xie Ruilong
3
2018
Methods of forming an air-gap spacer on a semiconductor device and the resulting device
Park Chanro , Kim Hoon , Sung Min Gyu , Xie Ruilong
8
2018
METHODS OF FORMING A PROTECTION LAYER ON AN ISOLATION REGION OF IC PRODUCTS COMPRISING FINFET DEVICES
Sung Min Gyu , Prindle Christopher M , Xie Ruilong , Lee Tek Po Rinus
6
2018
Self-aligned contact protection using reinforced gate cap and spacer portions
Park Chanro , Kim Hoon , Sung Min Gyu , Xie Ruilong
2
2018
Integrated circuit structure incorporating multiple gate-all-around field effect transistors having different drive currents and method
Min Gyu Sung , Ruilong Xie , Bipul C Paul
1
2019
Uniform bottom spacers in vertical field effect transistors
Yamashita Tenko , Sung Min Gyu , Xie Ruilong , Chi Cheng
1
2018
Transistor-based semiconductor device with air-gap spacers and gate contact over active area
Park Chanro , Kim Hoon , Sung Min Gyu , Liebmann Lars Wolfgang
9
2019
Methods, apparatus and system for forming source/drain contacts using early trench silicide cut
Park Chanro , Sung Min Gyu , Xie Ruilong , Suvarna Puneet H
1
2018
Methods of forming IC products comprising a nano-sheet device and a transistor device having first and second replacement gate structures
Park Chanro , Kim Hoon , Sung Min Gyu , Xie Ruilong
2018
Gate cuts after metal gate formation
Park Chanro , Sung Min Gyu , Xie Ruilong
3
2018
Integrated circuit structure, gate all-around integrated circuit structure and methods of forming same
Knorr Andreas , Frougier Julien , Sung Min Gyu , Liebmann Lars
1
2019
Hybrid spacer integration for field-effect transistors
Park Chanro , Sung Min Gyu , Xie Ruilong , Lee Dong-Ick
2019
Control of length in gate region during processing of VFET structures
Park Chanro , Sung Min Gyu , Xie Ruilong , Bentley Steven
3
2019
GATE CUT METHOD FOR REPLACEMENT METAL GATE
Park Chanro , Economikos Laertis , Sung Min Gyu , Xie Ruilong
6
2019
SELF-ALIGNED CONTACTS FOR VERTICAL FIELD EFFECT TRANSISTOR CELL HEIGHT SCALING
Park Chanro , Anderson Brent , Sung Min Gyu , Liebmann Lars
2019
Replacement gate formation with angled etch and deposition
Variam Naushad K , Sung Min Gyu , Lee Jae Young , Varghese Sony
1
2019