Method of synthesizing ito electron-beam resist and method of forming ito pattern using the same
作者： Sung-Lyul Maeng , Sung-Jin Shin , Ki-Chul Kim , Dae-Joon Kang
DOI:
关键词: Dissolution 、 Tetrahydrate 、 Optoelectronics 、 Nanotechnology 、 Tin chloride 、 Materials science 、 Indium chloride 、 Annealing (metallurgy) 、 Electron beam resist
摘要: Provided is a method of synthesizing an ITO electron beam resist and forming pattern. The synthesized by dissolving indium chloride tetrahydrate tin dihydrate in 2-ethoxy ethanol. pattern includes: film on substrate, patterning the film, annealing
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