Photoemission study of direct photomicromachining in poly(vinylidene fluoride)
作者： Eizi Morikawa , Jaewu Choi , Harish M. Manohara , Hisao Ishii , Kazuhiko Seki
DOI: 10.1063/1.372447
关键词: Ab initio 、 Electron spectroscopy 、 Fluoride 、 Analytical chemistry 、 Ab initio quantum chemistry methods 、 Molecular orbital 、 Photochemistry 、 Mass spectrometry 、 Fluorine 、 Chemistry 、 Photoemission spectroscopy
摘要: Direct pattern transfer onto poly(vinylidene fluoride) was achieved by using x-ray photons from a synchrotron radiation source. Quadrupole mass spectrometry and ultraviolet photoemission spectroscopy, combined with ab initio molecular orbital calculations, were employed to investigate the mechanism of direct photomicromachining. The identified H2, F, HF as etched products, no carbon containing species being detected. changes in spectra due photodegradation analyzed comparison calculations. This analysis indicated that high degree conjugation is generated degraded polymer loss fluorine atoms. It concluded photomicromachining ascribable shrinking irradiated region defluorination generation conjugation.
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