Metal-insulator transition in epitaxial Ga-doped ZnO films via controlled thickness.

作者: Joynarayan Mukherjee , B R K Nanda , M S Ramachandra Rao

DOI: 10.1088/1361-648X/ABC800

关键词: Thin filmMetal–insulator transitionPulsed laser depositionWeak localizationMagnetoresistanceElectron mobilityVariable-range hoppingElectrical resistivity and conductivityCondensed matter physicsMaterials science

摘要: Understanding and tuning of metal-insulator transition (MIT) in oxide systems is an interesting active research topics condensed matter physics. We report thickness dependent MIT Ga-doped ZnO (Ga:ZnO) thin films grown by pulsed laser deposition technique. From the electrical transport measurements, we find that while thinnest film (6 nm) exhibits a resistivity 0.05 Ω cm, lying insulating regime, thickest (51 has 6.6 × 10-4 cm which shows metallic type conduction. Our analysis reveals Mott's variable range hopping model governs behavior 6 nm whereas 2D weak localization (WL) phenomena appropriate to explain electron thicker Ga:ZnO films. Magnetoresistance study further confirms presence strong WL observed 20 above density functional calculations, it found due surface reconstruction Ga doping, crystalline disorder sets very introduce localized states thereby, restricts donor mobility.

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