作者: Y. Rytz-Froidevaux , R. P. Salath� , H. H. Gilgen
DOI: 10.1007/BF00617497
关键词: Etching (microfabrication) 、 Pyrolytic carbon 、 Optoelectronics 、 Thin film 、 Crystal growth 、 Analytical chemistry 、 Laser 、 Chemistry 、 Microstructure 、 Deposition (phase transition) 、 Photodissociation
摘要: Deposition and etching processes based on the interaction of laser light with a substrate surface molecules surrounding ambient are discussed in this tutorial review. This “laser writing” approach is photolytic, pyrolytic, or photoelectrochemical microreactions. The fundamental properties such reactions corresponding processing parameters (e.g. deposition etch rate, resolution) discussed. Important published results for by photolysis, pyrolysis, summarized form tables. A special list potential applications techniques all materials used thus far included.