Transparent conductive film laminate and its etching method
作者： Hiroaki Saigo , Katsuhiko Koike , Shin Fukuda , Mitsuru Sadamoto , 宏明 西郷
DOI:
关键词: Substrate (electronics) 、 Composite material 、 Inert gas 、 Dry etching 、 Sputtering 、 Etching (microfabrication) 、 Neon 、 Materials science 、 Argon 、 Layer (electronics)
摘要: PROBLEM TO BE SOLVED: To make a patterning on transparent conductive film laminate with small slippage of side end position. SOLUTION: A is made laminate, which by laminating layer high refraction factor (a) 20 and metal (b) 30 substrate (A) 10, dry etching method sputtering an inert gas. The gas used for the contains as principal content at least one selected from neon, argon, krypton xenon. this method. COPYRIGHT: (C)2002,JPO
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