Liquid processing method and liquid processing apparatus
作者： Mitsunori Nakamori , Noritaka Uchida
DOI:
关键词: Chemical engineering 、 Analytical chemistry 、 Liquid film 、 Substrate (printing) 、 Materials science 、 Processing methods 、 Process (computing)
摘要: A liquid processing method includes: placing a plate adjacently to at least one of surfaces target substrate, and supplying process into gap between the thereby forming film liquid; subjecting substrate using state with thus formed; gas film, breaking after finishing process.
google.it 参考文章(16)
Takashi Yabuta, Hiromitsu Nanba, Takehiko Orii, Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium ,(2004)
Takayuki Toshima, Osamu Kuroda, Hiroki Taniyama, Processing apparatus and substrate processing method ,(2003)
Hiromitsu Nanba, Takehiko Orii, 武彦 折居, 宏光 難波, Masahiro Mukoyama, 正浩 向山, Method and apparatus for liquid treatment ,(2002)
Takayuki Toshima, Takehiko Orii, 武彦 折居, 孝之 戸島, Liquid treatment apparatus and method therefor ,(2001)
Osamu Kuroda, 黒田 修, 博己 谷山, Hiromi Taniyama, Substrate treatment equipment and method therefor ,(2002)
横内 健一, Kenichi Yokouchi, Method and apparatus of processing substrate ,(2002)
Sadao Hirae, 貞雄 平得, Substrate washing apparatus and substrate washing method ,(2002)
Hiraoka Nobuyasu, METHOD AND DEVICE FOR SUBSTRATE PROCESSING ,(2004)
Kobayashi Kazuo, TRANSFER METHOD FOR SEMICONDUCTOR WAFER ,(1992)
Takayuki Toshima, Takehiko Orii, 武彦 折居, 孝之 戸島, Substrate processing unit and substrate processing method ,(2001)