Field enhanced inductively coupled plasma (fe-icp) reactor

作者: Kartik Ramaswamy , Valentin N. Todorow , Michael D. Willwerth , Samer Banna

DOI:

关键词: Radio frequencyField (physics)PlasmaDielectricOptoelectronicsElectrodeCapacitively coupled plasmaInductively coupled plasmaAnalytical chemistryChemistry

摘要: Embodiments of field enhanced inductively coupled plasma reactors and methods use same are provided herein. In some embodiments, a processing system may include process chamber having dielectric lid source assembly disposed above the lid. The includes one or more coils configured to couple RF energy into form maintain therein, electrodes capacitively wherein electrically coils, an generator inductive electrodes. heater element be between assembly,

参考文章(21)
Tomohiro Okumura, Hideo Haraguchi, Shozo Watanabe, Ichiro Nakayama, Method and device for plasma treatment ,(1998)
Ikuo Sawada, Songyun Kang, Shigeru Kasai, Plasma processing apparatus and method ,(2009)
Yashima Shinji, PLASMA TREATMENT APPARATUS ,(2002)
Patrick L. Leahey, Zhi-Wen Sun, Robert E. Ryan, Xue-Yu Qian, Maocheng Li, John Holland, Valentin N. Todorov, Arthur H. Sato, Plasma reactor with dynamic RF inductive and capacitive coupling control ,(2000)
Patrick Leahey, Hoan Hai Nguyen, Maocheng Li, John Holland, Robert P. Hartlage, Valentin N. Todorov, Icp window heater integrated with faraday shield or floating electrode between the source power coil and the icp window ,(2001)