作者: Kartik Ramaswamy , Valentin N. Todorow , Michael D. Willwerth , Samer Banna
DOI:
关键词: Radio frequency 、 Field (physics) 、 Plasma 、 Dielectric 、 Optoelectronics 、 Electrode 、 Capacitively coupled plasma 、 Inductively coupled plasma 、 Analytical chemistry 、 Chemistry
摘要: Embodiments of field enhanced inductively coupled plasma reactors and methods use same are provided herein. In some embodiments, a processing system may include process chamber having dielectric lid source assembly disposed above the lid. The includes one or more coils configured to couple RF energy into form maintain therein, electrodes capacitively wherein electrically coils, an generator inductive electrodes. heater element be between assembly,