作者: Mahesh Kumar , Basanta Roul , Thirumaleshwara N. Bhat , Mohana K. Rajpalke , Neeraj Sinha
DOI: 10.1007/S11051-010-0121-1
关键词: Quantum dot 、 Materials science 、 Plasma 、 Condensed matter physics 、 Morphology (linguistics) 、 Optoelectronics 、 Molecular beam epitaxy 、 Photoluminescence 、 Kinetics 、 Indium nitride 、 Scaling
摘要: One of the scientific challenges growing InN quantum dots (QDs), using Molecular beam epitaxy (MBE), is to understand fundamental processes that control morphology and distribution QDs. A systematic manipulation morphology, optical emission, structural properties InN/Si (111) QDs demonstrated by changing growth kinetics parameters such as flux rate time. Due large lattice mismatch, between Si (~8%), formed from Strannski–Krastanow (S–K) mode are dislocated. Despite variations in strain (residual) shape, both dot size pair separation show scaling behavior. We observed sizes, for samples grown under varying conditions, follow function.