Methods of dividing layouts and methods of manufacturing semiconductor devices using the same
作者： Hye-Soo Shin , Sang-Wook Seo , Jeong-Hoon Lee
DOI:
关键词: Optics 、 Lithography 、 Semiconductor device 、 Nanotechnology 、 Engineering
摘要: Target pattern layouts that include lower and upper target patterns are designed. Each is combined with a at least partially overlaps top surface thereof to form combination structures. The structures divided into first second A formed from the in structure third structure. lithography processes, respectively. fourth
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