Co-sputtered Si-Cr resistive films
作者： M. Fern�ndez , J. P. Gonz�lez , J. M. Albella , J. M. Mart�nez-Duart
DOI: 10.1007/BF01161481
关键词: Silicon 、 Thin film 、 Electrical resistivity and conductivity 、 Optics 、 Materials science 、 Resistive touchscreen 、 Composite material 、 Thermal treatment 、 Wafer 、 Chromium 、 Carbon film
摘要: Si-Cr films of variable composition between pure silicon and chromium have been deposited by co-sputtering on to glass substrates thermally oxidized wafers. In order assess the applications thin film resistors, electrical characteristics determined as a function composition, thickness, thermal treatments, etc.
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