An analysis of the TiN plasmachemical vapor deposition process based on optical emission spectroscopy measurements
作者： S Peter , H Giegengack , F Richter , R Tabersky , U König
DOI: 10.1016/S0040-6090(01)01375-X
关键词: Titanium nitride 、 Titanium 、 Thin film 、 Analytical chemistry 、 Chemistry 、 Emission spectrum 、 Plasma-enhanced chemical vapor deposition 、 Chemical vapor deposition 、 Deposition (phase transition) 、 Titanium chloride
摘要: Optical emission spectroscopy measurements and film deposition experiments were performed for better understanding control of the plasmachemical vapor (PCVD) process used in coating production Widia/Valenite. The effects titanium chloride flow, nitrogen mean discharge current density pressure investigated. coatings characterized with respect to rate, composition, crystallographic structure Vickers microhardness. In particular, dependence on parameters signals (lines/bands) from 12 species (Ti, Ti + , Cl, Cl H 2 H, N N, Ar ) involved into TiN was analyzed. Additional spatially resolved OES revealed particular that arises only near cathode surface. Based an empirical model it shown atomic is related intrinsic rate whereas ionized results etching not yet bounded
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