Optical emission spectroscopy on pulsed-DC plasmas used for TiN depositions
作者： K.S Mogensen , S.S Eskildsen , C Mathiasen , J Bøttiger
DOI: 10.1016/S0257-8972(97)00529-X
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摘要: Abstract The plasma-assisted chemical vapour deposition process in a large-scale industrial plant for coating of TiN on tool steels was investigated by optical emission spectroscopy. Several atomic lines and molecular bands were identified. A parametric study the dependence bias voltage, total pressure gas flows, H 2 , N Ar TiCl 4 plasma characteristics performed to gain understanding influence parameters process. With change parameters, large variations emitted light, corresponding changes conditions, observed. In parameter range studied, rate depends linearly + signal when varying flow, whereas no clear correlation between OES could be found other parameters.
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