Plasma CVD: process capabilities and economic aspects

摘要: Abstract Process shortcomings in both PVD (physical vapour deposition) and CVD (chemical technologies have led to an increasing interest plasma coating technology. Over the past 10–15 years, extensive research effort has been made this area but problems have, a large extent, prevented development of technology into production process. Recent progress with respect equipment as well process know-how now establishment technique for producing TiN TiCN coatings on hardmetal steel routine basis at deposition temperatures range 480–560°C. This recent is reviewed briefly, overview properties given. The ability supplement complement conventional described, examples from industrial applications demonstrate possibilities tools rather complex shapes. show that anti-stick solve industry, none which could be solved by existing technologies. Some aspects economics are described tentatively compared those PVD.