Optical emission spectroscopy on an industrial PACVD system for titanium nitride

摘要: Abstract The optical emission spectra of an industrial PACVD process for coating hard metal and HSS tools with titanium nitride (TiN) layers by a micro-pulsed d.c. discharge were investigated. For recording the simple economy-priced spectrometer resolution about 0.5 nm was used. Atomic lines H, Ar Ar+, some molecular bands H2, N2, N2+ NH found. With sensitivity available it not possible to clearly identify atomic titanium, nitrogen or chlorine chlorides. Because comes only from species made up five elements one can expect that many spectral are highly correlated. reason, principal component analysis should offer good tool those parts in which distinguish single spectra, would be relevant plasma monitoring. However, factors describing responsible TiN formation found within our experimental limits.