作者: L. Dejam , A. A. Shokri , H. Honarvar Nazari , S. M. Elahi
DOI: 10.1007/S10854-017-6678-Z
关键词: Sputtering 、 Crystal structure 、 Microstructure 、 Amorphous solid 、 Heterojunction 、 Physical vapor deposition 、 Materials science 、 Substrate (electronics) 、 Analytical chemistry 、 Photoluminescence
摘要: In this work two samples of Ag/Cu/Cu2O and Al:ZnO (AZO) multilayers, on glass substrates were prepared. The Ag/Cu layers obtained by the physical vapor deposition (PVD) method, while Cu2O AZO deposited DC reactive magnetron sputtering. structural morphology properties considered studied. X-ray diffraction (XRD) showed that first junction signifies a crystal structure compounds Ag, Cu Cu2O, but latter sample an amorphous structure. It was shown roughness glass/Ag/Cu/Cu2O substantially lower than layer substrate. addition, microstructure consideration revealed surface highly homogenous with average grain size 35 nm. Moreover, we investigated Cu2O/AZO heterojunction. low turn-on voltage about 0.64 V obtained, which indicate heterojunction acts as rectifier diode. ideality factor determined to be 10.28.