Structural properties of RF-magnetron sputtered Cu2O thin films
作者： C.L. Azanza Ricardo , M. D'Incau , M. Leoni , C. Malerba , A. Mittiga
DOI: 10.1016/J.TSF.2011.07.066
关键词:
摘要: Abstract Cuprous oxide thin films were produced on soda-lime glass substrates using reactive RF-magnetron sputtering. The influence of deposition parameters and temperature composition structural properties the single layers was extensively studied X-ray diffraction. control over microstructure residual stresses is possible by changing gas pressure temperature. Fiber textured Cu2O showing a [100] preferred orientation fraction untextured domains can be obtained: suitable modeling taking this into account shows presence strong compressive stress decreasing with Highly reproducible obtained, whose preserved when sputtering tungsten zinc substrates.
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