Tetrakis(dimethylamido)hafnium Adsorption and Reaction on Hydrogen Terminated Si(100) Surfaces
作者： Kejing Li , Shenggang Li , Ning Li , David A. Dixon , Tonya M. Klein
DOI: 10.1021/JP101363R
关键词: Chemistry 、 Intramolecular force 、 Adsorption 、 Fourier transform infrared spectroscopy 、 Hafnium 、 Density functional theory 、 Hydrogen 、 Mass spectrometry 、 Attenuated total reflection 、 Analytical chemistry
摘要: The adsorption and reaction of tetrakis(dimethylamido)hafnium (TDMAH) on hydrogen terminated Si(100) were studied by using in situ attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR), transmission IR, quadrupole mass spectrometry (Q-MS). Surface gas phase reactions investigated at temperatures between 25 300 °C. Density functional theory (DFT) calculations benchmarked coupled cluster small models performed for decomposition via intramolecular insertion β-hydride elimination as well the TDMAH onto a surface. N−Si CH2−Si bonds due to Si windows observed while N−Ge CH2−Ge Ge internal element (IRE) ATR-FTIR 100 Also formation Hf−H three-member-ring species surface; former was confirmed control D2O exchange expe...
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