Substrate for nitride semiconductor growth

作者: Toshiki Makimoto , Masanobu Hiroki , Kazuhide Kumakura

DOI:

关键词: OptoelectronicsLayer (electronics)Sapphire substrateMaterials scienceNitride semiconductorsAtomic layer epitaxySubstrate (electronics)Electronic engineeringCrystal

摘要: A substrate for growth of nitride semiconductor capable obtaining a high-quality crystal layer is provided. on sapphire (1) according to one embodiment the invention provided with an Al2O3 (2) as separately (1), AlON (3) which first layer, and AlN (4) second layer. With respect are deposited in this order.

参考文章(21)
Jamal Ramdani, Paige M. Holm, Michael S. Lebby, Method of growing gallium nitride on a spinel substrate ,(1996)
F. Widmann, G. Feuillet, B. Daudin, J. L. Rouvière, Low temperature sapphire nitridation: A clue to optimize GaN layers grown by molecular beam epitaxy Journal of Applied Physics. ,vol. 85, pp. 1550- 1555 ,(1999) , 10.1063/1.369286
Cyril Pernot, Akira Hirano, Motoaki Iwaya, Theeradetch Detchprohm, Hiroshi Amano, Isamu Akasaki, Low-Intensity Ultraviolet Photodetectors Based on AlGaN Japanese Journal of Applied Physics. ,vol. 38, pp. L487- L489 ,(1999) , 10.1143/JJAP.38.L487
L. Liu, J.H. Edgar, Substrates for gallium nitride epitaxy Materials Science & Engineering R-reports. ,vol. 37, pp. 61- 127 ,(2002) , 10.1016/S0927-796X(02)00008-6
Wataru Nakao, Hiroyuki Fukuyama, Single crystalline AlN film formed by direct nitridation of sapphire using aluminum oxynitride buffer Journal of Crystal Growth. ,vol. 259, pp. 302- 308 ,(2003) , 10.1016/J.JCRYSGRO.2003.07.026
H. Amano, N. Sawaki, I. Akasaki, Y. Toyoda, Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer Applied Physics Letters. ,vol. 48, pp. 353- 355 ,(1986) , 10.1063/1.96549
Yong Suk Cho, Eui Kwan Koh, Young Ju Park, Dongwan Koh, Eun Kyu Kim, Youngboo Moon, Shi-Jong Leem, Gyeungho Kim, Dongjin Byun, Effects of N+-implanted sapphire (0 0 0 1) substrate on GaN epilayer Journal of Crystal Growth. ,vol. 236, pp. 538- 544 ,(2002) , 10.1016/S0022-0248(02)00840-0