Strange hardness characteristic of hydrogenated diamond-like carbon thin film by plasma enhanced chemical vapor deposition process
作者： Neeraj Dwivedi , Sushil Kumar , Hitendra K. Malik
DOI: 10.1063/1.4775372
关键词: Combustion chemical vapor deposition 、 Nitrogen 、 Diamond-like carbon 、 Nanostructure 、 Chemical vapor deposition 、 Materials science 、 Carbon film 、 Plasma-enhanced chemical vapor deposition 、 Chemical engineering 、 Nanotechnology 、 Thin film
摘要: By creating nanostructures and controlling the hydrogen content sp3/sp2 bonding ratio, we report formation of very hard (35.8 GPa) hydrogenated diamond-like carbon film at a self-bias −100 V using simple radio frequency-plasma enhanced chemical vapor deposition process. When is varied modifications such as incorporation nitrogen Ag interlayer are executed, mechanical properties films, however, got altered that correlated well with structural changes investigated various spectroscopic microscopic techniques.
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