Cu and Ag deposition on layeredp-typeWSe2: Approaching the Schottky limit

作者: W. Jaegermann , C. Pettenkofer , B. A. Parkinson

DOI: 10.1103/PHYSREVB.42.7487

关键词: OverlayerEpitaxyX-ray photoelectron spectroscopySurface photovoltageAnalytical chemistrySchottky diodeSchottky barrierBand bendingDopingOpticsMaterials science

摘要: The interaction of Cu and Ag on the van der Waals (0001) face p-type ${\mathrm{WSe}}_{2}$ has been investigated in relation to Schottky-barrier formation Schottky solar cells using x-ray uv photoelectron spectroscopy (XPS,UPS), low-energy electron diffraction (LEED), surface photovoltage measurements. XPS UPS results show growth a metallic overlayer for small coverages without detectable any interfacial reaction layer. In addition, LEED experiments indicate epitaxially grown (111) metal layers form clusters. Therefore, we conclude that an atomically abrupt interface between semiconductor M(111) overlayers is formed. observed band bending obtained from binding-energy shifts corresponds work-function difference following Schottky-Mott theory. However, measured at 300 100 K not good correspondence thermionic-emission model barriers. alternative suggested considering n-type doping due intercalation adsorbed atoms.

参考文章(53)
R. H. Williams, A. McKinley, G. J. Hughes, V. Montgomery, I. T. McGovern, Metal–GaSe and metal–InP interfaces: Schottky barrier formation and interfacial reactions Journal of Vacuum Science and Technology. ,vol. 21, pp. 594- 598 ,(1982) , 10.1116/1.571793
T. Tambo, C. Tatsuyama, Reactivity at interfaces of Cu, Ag and Au−GaSe layered compounds Surface Science. ,vol. 222, pp. 332- 342 ,(1989) , 10.1016/0039-6028(89)90363-4
X. Zaoui, R. Mamy, A. Chevy, Au/InSe interface formation: A photoemission study Surface Science. ,vol. 204, pp. 174- 182 ,(1988) , 10.1016/0039-6028(88)90275-0
I.T. McGovern, E. Dietz, H.H. Rotermund, A.M. Bradshaw, W. Braun, W. Radlik, J.F. McGilp, Soft X-ray photoemission spectroscopy of metal-molybdenum bisulphide interfaces Surface Science. ,vol. 152, pp. 1203- 1212 ,(1985) , 10.1016/0039-6028(85)90540-0
Jeffrey R Lince, David J Carre, P FLEISCHAUER, AEROSPACE CORP EL SEGUNDO CA CHEMISTRY AND PHYSICS LAB, Effects of Argon-Ion Bombardment on the Basal Plan Surface of MoS2. Langmuir. ,vol. 2, pp. 805- 808 ,(1986) , 10.1021/LA00072A026
Jeffrey R. Lince, David J. Carré, Paul D. Fleischauer, Schottky-barrier formation on a covalent semiconductor without Fermi-level pinning: The metal-MoS2(0001) interface. Physical Review B. ,vol. 36, pp. 1647- 1656 ,(1987) , 10.1103/PHYSREVB.36.1647
F.S. Ohuchi, W. Jaegermann, B.A. Parkinson, XPS investigation of the reaction of SnS2(0001) with Cu Surface Science. ,vol. 194, ,(1988) , 10.1016/0039-6028(94)91236-X
W. Jaegermann, F. S. Ohuchi, B. A. Parkinson, Electrochemical and solid state reactions of copper with n-SnS2 Berichte der Bunsengesellschaft für physikalische Chemie. ,vol. 93, pp. 29- 37 ,(1989) , 10.1002/BBPC.19890930107
W. Jaegermann, F. S. Ohuchi, B. A. Parkinson, The interaction of group IB metals with van der waals faces of semiconducting metal dichalcogenides Surface and Interface Analysis. ,vol. 12, pp. 293- 296 ,(1988) , 10.1002/SIA.740120504
W. Jaegermann, F.S. Ohuchi, B.A. Parkinson, Interaction of Cu, Ag and Au with van der Waals faces of WS, and SnS2 Surface Science. ,vol. 201, pp. 211- 227 ,(1988) , 10.1016/0039-6028(88)90607-3