Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

作者: Jae-Min Kim , Han-Bo-Ram Lee , Clement Lansalot , Christian Dussarrat , Julien Gatineau

DOI: 10.1143/JJAP.49.05FA10

关键词: Atomic layer depositionSubstrate (electronics)Inorganic chemistryAtomic layer epitaxyThin filmMaterials scienceIsopropylCobaltDeposition (chemistry)Cyclopentadienyl complexGeneral EngineeringGeneral Physics and Astronomy

摘要: … Co thin film was produced well not only on both SiO2 (100 nm) and Si(001) substrate but also on Kapton tape which is composed of polyimide. Furthermore, our group successfully …

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