Atomic Layer Deposition of Co Using N2/H2 Plasma as a Reactant
作者： Jaehong Yoon , Han-Bo-Ram Lee , Doyoung Kim , Taehoon Cheon , Soo-Hyun Kim
DOI: 10.1149/2.077111JES
关键词: Plasma 、 Plasma processing 、 Analytical chemistry 、 Materials science 、 Atomic layer deposition
摘要: … using plasma of N 2 and H 2 mixture, instead of NH 3 plasma. … previous results using NH 3 plasma were carried out in terms … film using N 2 /H 2 plasma was studied using high resolution …
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