Effects of process parameters on the adhesive strength of copper electrodeposits in a bench-scale electrowinning cell

作者: A. Murray , H. Khakbaz , A. Pranowo , N. Aslin , M. Bobby Kannan

DOI: 10.1080/03719553.2015.1109183

关键词: MicrostructureCopperCathodeChlorideMetallurgySubstrate (chemistry)Grain sizeElectrolyteMaterials scienceElectrowinning

摘要: In this study, the effects of various process parameters on adhesive strength copper electrodeposits stainless steel cathodes produced in a laboratory scale electrowinning cell were investigated. The experimental results showed that chloride ion concentration and current density had significant effect strength. Electrolyte temperature cupric also influenced to some extent, whereas cobaltous Guar dosage no noticeable effect. Microstructure analysis indicated which affected grain size deposit at substrate/deposit interface strength, i.e., fine grains exhibited higher than coarse grains.

参考文章(20)
AM Alfantazi, D Valic, A study of copper electrowinning parameters using a statistically designed methodology Journal of Applied Electrochemistry. ,vol. 33, pp. 217- 225 ,(2003) , 10.1023/A:1024014727082
W. G. Davenport, A. K. Biswas, Extractive Metallurgy of Copper ,(2002)
Nisit Tantavichet, Somsak Damronglerd, Orawan Chailapakul, Influence of the interaction between chloride and thiourea on copper electrodeposition Electrochimica Acta. ,vol. 55, pp. 240- 249 ,(2009) , 10.1016/J.ELECTACTA.2009.08.045
Masataka Hakamada, Yoshiaki Nakamoto, Hiroshi Matsumoto, Hajime Iwasaki, Youqing Chen, Hiromu Kusuda, Mamoru Mabuchi, Relationship between hardness and grain size in electrodeposited copper films Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. ,vol. 457, pp. 120- 126 ,(2007) , 10.1016/J.MSEA.2006.12.101
C. Lupi, M. Pasquali, A. Dell’Era, Studies concerning nickel electrowinning from acidic and alkaline electrolytes Minerals Engineering. ,vol. 19, pp. 1246- 1250 ,(2006) , 10.1016/J.MINENG.2006.04.002
S.E. Hadian, D.R. Gabe, Residual stresses in electrodeposits of nickel and nickel–iron alloys Surface & Coatings Technology. ,vol. 122, pp. 118- 135 ,(1999) , 10.1016/S0257-8972(99)00328-X
C.P. Fabian, M.J. Ridd, M.E. Sheehan, Assessment of activated polyacrylamide and guar as organic additives in copper electrodeposition Hydrometallurgy. ,vol. 86, pp. 44- 55 ,(2007) , 10.1016/J.HYDROMET.2006.11.002
Ashutosh Sharma, Sumit Bhattacharya, Ranjan Sen, B.S.B. Reddy, H.-J. Fecht, Karabi Das, Siddhartha Das, Influence of current density on microstructure of pulse electrodeposited tin coatings Materials Characterization. ,vol. 68, pp. 22- 32 ,(2012) , 10.1016/J.MATCHAR.2012.03.002