The formation and growth mechanisms of silica thin film and spherical particles through the Stöber process

摘要: Abstract Silica nanoparticles and thin film on flat substrate were simultaneously prepared by the Stober method. The growth kinetics of these precipitates fine structure surface investigated atomic force microscopy. formed a hydrophilic was uniform, with root-mean-square (RMS) roughness ≈1 nm. observed to be slower than that particles, indicating silica limited diffusion reactive species. On other hand, hydrophobic not flat, RMS ≈10 nm, characterized convex microstructures two distinct sizes its surface. appearance delay in formation indicate precipitates, including spherical colloids, as aggregations primary particles appearing precursor solution, then grew adhesion forming continuously solution.