作者: H Okudera , Y Yokogawa
DOI: 10.1016/S0040-6090(01)01596-6
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摘要: Abstract Titania thin film (≤170 nm in thickness), generally flat, but with a root mean square (RMS) roughness of ∼2–3 nm, was deposited on Si(100) substrate by hydrolysis Ti–tetraethoxide ethanol at 20°C. Film thickness d (nm) easily controlled varying the deposition time t (min): =142 log( )−131 ( ≥8.4). XRD measurements showed that as-deposited amorphous and it transformed to polycrystalline TiO 2 (anatase phase) 37% volume reduction annealing air 350°C. No sign rutile or quartz (SiO ) phases found films annealed temperatures up 800°C. Changes surface morphology were examined using atomic force microscopy (AFM). The fine structure observed indicated composed an agglomeration adhered primary colloidal particles, which present precursor solution. A size these particles increase reaction also AFM. growth processes for larger coexisting solution are explained adhesion model, both grow occurring vicinity ‘substrates’.