作者: Byung Jin Cho , Eun-Kyung Suh , Chang-Hee Hong , S. Chandramohan , Ji Hye Kang
DOI: 10.1021/AM3026079
关键词: Ohmic contact 、 Light-emitting diode 、 Materials science 、 Graphene nanoribbons 、 Graphene oxide paper 、 Optoelectronics 、 Quantum tunnelling 、 Nanotechnology 、 Annealing (metallurgy) 、 Thin film 、 Graphene
摘要: This paper reports on the evaluation of impact introducing interlayers and postmetallization annealing graphene/p-GaN ohmic contact formation performance associated devices. Current–voltage characteristics contacts with ultrathin Au, Ni, NiOx were studied using transmission line model circular geometry. Direct interface was identified to be highly rectifying improved as a result adhesion between graphene p-GaN. Ohmic realized when interlayer is introduced p-GaN followed by annealing. Temperature-dependent I–V measurements revealed that current transport modified from thermionic field emission for direct tunneling graphene/metal/p-GaN contacts. The mechanism results interfacial reactions occur ...