Impact of interlayer processing conditions on the performance of GaN light-emitting diode with specific NiOx/graphene electrode.

作者: Byung Jin Cho , Eun-Kyung Suh , Chang-Hee Hong , S. Chandramohan , Ji Hye Kang

DOI: 10.1021/AM3026079

关键词: Ohmic contactLight-emitting diodeMaterials scienceGraphene nanoribbonsGraphene oxide paperOptoelectronicsQuantum tunnellingNanotechnologyAnnealing (metallurgy)Thin filmGraphene

摘要: This paper reports on the evaluation of impact introducing interlayers and postmetallization annealing graphene/p-GaN ohmic contact formation performance associated devices. Current–voltage characteristics contacts with ultrathin Au, Ni, NiOx were studied using transmission line model circular geometry. Direct interface was identified to be highly rectifying improved as a result adhesion between graphene p-GaN. Ohmic realized when interlayer is introduced p-GaN followed by annealing. Temperature-dependent I–V measurements revealed that current transport modified from thermionic field emission for direct tunneling graphene/metal/p-GaN contacts. The mechanism results interfacial reactions occur ...

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