Adhesion improvement of graphene/copper interface using UV/ozone treatments
作者： Jeongmin Seo , Won Seok Chang , Taek-Soo Kim
DOI: 10.1016/J.TSF.2015.01.007
关键词: X-ray photoelectron spectroscopy 、 Graphene 、 Substrate (chemistry) 、 Materials science 、 Adhesion 、 Chemical engineering 、 Chemical modification 、 Ozone 、 Inorganic chemistry 、 Copper 、 Photoemission spectroscopy
摘要: Abstract The weak adhesion between graphene and its substrate is a potentially significant problem for graphene-based electronic devices. However, quantitative studies on improvement using simple surface treatments have not yet been reported. In this study, we report the of graphene/copper interface UV/ozone treatment. energy measured directly double cantilever beam fracture mechanics testing. A significantly improved 2.10 ± 0.27 J/m2 achieved with 15 min treatment; approximately 200% that without chemical modification also characterized X-ray photoemission spectroscopy (XPS).
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sci-hub.se 参考文章(32)
Wei Li, Yiran Liang, Dangmin Yu, Lianmao Peng, Kurt P. Pernstich, Tian Shen, A. R. Hight Walker, Guangjun Cheng, Christina A. Hacker, Curt A. Richter, Qiliang Li, David J. Gundlach, Xuelei Liang, UV/Ozone treatment to reduce metal-graphene contact resistance arXiv: Materials Science. ,(2012) , 10.1063/1.4804643
Haihua Tao, Joel Moser, Francesc Alzina, Q. Wang, C. M. Sotomayor-Torres, The Morphology of Graphene Sheets Treated in an Ozone Generator Journal of Physical Chemistry C. ,vol. 115, pp. 18257- 18260 ,(2011) , 10.1021/JP2050756
Micaela Crespo-Quesada, Jean-Michel Andanson, Artur Yarulin, Byungkwong Lim, Younan Xia, Lioubov Kiwi-Minsker, UV–Ozone Cleaning of Supported Poly(vinylpyrrolidone)-Stabilized Palladium Nanocubes: Effect of Stabilizer Removal on Morphology and Catalytic Behavior Langmuir. ,vol. 27, pp. 7909- 7916 ,(2011) , 10.1021/LA201007M
Jaewon Hwang, Taeshik Yoon, Sung Hwan Jin, Jinsup Lee, Taek-Soo Kim, Soon Hyung Hong, Seokwoo Jeon, Enhanced Mechanical Properties of Graphene/Copper Nanocomposites Using a Molecular-Level Mixing Process Advanced Materials. ,vol. 25, pp. 6724- 6729 ,(2013) , 10.1002/ADMA.201302495
A. K. Geim, K. S. Novoselov, The rise of graphene Nature Materials. ,vol. 6, pp. 183- 191 ,(2007) , 10.1038/NMAT1849
Chongmin Lee, Jaehui Ahn, Ki Bong Lee, Donghwan Kim, Jihyun Kim, Graphene-based flexible NO2 chemical sensors Thin Solid Films. ,vol. 520, pp. 5459- 5462 ,(2012) , 10.1016/J.TSF.2012.03.095
Byung Jin Cho, Eun-Kyung Suh, Chang-Hee Hong, S. Chandramohan, Ji Hye Kang, Beo Deul Ryu, Jong Han Yang, Seongjun Kim, Hynsoo Kim, Jong Bae Park, Taek Yong Kim, Impact of interlayer processing conditions on the performance of GaN light-emitting diode with specific NiOx/graphene electrode. ACS Applied Materials & Interfaces. ,vol. 5, pp. 958- 964 ,(2013) , 10.1021/AM3026079
T. Sun, Z. L. Wang, Z. J. Shi, G. Z. Ran, W. J. Xu, Z. Y. Wang, Y. Z. Li, L. Dai, G. G. Qin, Multilayered graphene used as anode of organic light emitting devices Applied Physics Letters. ,vol. 96, pp. 133301- ,(2010) , 10.1063/1.3373855
Seoung-Ki Lee, Ho Young Jang, Sukjae Jang, Euiyoung Choi, Byung Hee Hong, Jaichan Lee, Sungho Park, Jong-Hyun Ahn, All Graphene-Based Thin Film Transistors on Flexible Plastic Substrates Nano Letters. ,vol. 12, pp. 3472- 3476 ,(2012) , 10.1021/NL300948C
Chung Wei Chen, Fan Ren, Gou-Chung Chi, Sheng-Chun Hung, Y. P. Huang, Jihyun Kim, Ivan I. Kravchenko, Stephen J. Pearton, UV ozone treatment for improving contact resistance on graphene Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. ,vol. 30, pp. 060604- ,(2012) , 10.1116/1.4754566