Atomic layer deposited photocatalysts: comprehensive review on viable fabrication routes and reactor design approaches for photo-mediated redox reactions

作者: N. K. R. Eswar , Satyapaul A. Singh , Jaeyeong Heo

DOI: 10.1039/C9TA04780H

关键词: PorosityPhotocatalysisAtomic layer depositionNanotechnologyThin filmMaterials scienceBand gapMicroscale chemistryFabricationCatalysis

摘要: Photocatalysis (PC) and photoelectrocatalysis (PEC) are attractive routes to utilize the abundant solar energy for energy- (H2 photo-reformed organics) environment- (water remediation) related applications. The fundamental challenges with PC PEC photon absorption, restricted charge diffusion lengths because of exciton recombination, photo-corrosion, kinetics reactions. These limitations can be addressed by suitable catalyst design precisely controlled morphology active sites at atomic precision. Atomic layer deposition (ALD) is one such efficient route establish thorough control photocatalyst fabrication. Thanks ALD, it now feasible synthesize particles, thin films, core–shell structures, porous membranous photocatalytic materials highest precision homogeneity. One further challenge understanding probable reactor designs when exploiting ALD-based coatings. Herein, we reviewed various possible fabricate photocatalysts using ALD insights PC/PEC reactions based on particulate, film, core–shell, materials. This review also discusses importance translating underlying reaction mechanisms scale-up respect approach. Initially, basic environmental applications growth-controlled systems given attention. Subsequently, more microscale combinations over-coatings in transforming macroscale discussed. Finally, prospects large-scale corresponding influential factors, as high residence time scales, bandgap engineering, light penetration, thickness applications, examined detail.

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