Automatic film deposition control
作者： Armando Iturralde
DOI:
关键词: Ellipsometry 、 Optics 、 Wafer 、 Deposition rate 、 Deposition (phase transition) 、 Refractive index 、 Materials science 、 Thin film
摘要: A film deposition control system and method in which a rate monitor an ellipsometer are used to the thickness of thin being deposited on wafer. The is also detect refractive index deposited, detected value ratio reactive gases injected into processing chamber.
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