作者: Michael Rohwerder , Carsten Benndorf
DOI: 10.1016/0039-6028(94)91493-1
关键词: Atmospheric temperature range 、 Adsorption 、 Analytical chemistry 、 Activation energy 、 Sticking coefficient 、 Isothermal process 、 Desorption 、 Work function 、 Chemistry 、 Thermal desorption spectroscopy 、 Physical chemistry 、 Materials Chemistry 、 Surfaces, Coatings and Films 、 Surfaces and Interfaces 、 Condensed matter physics
摘要: Abstract The adsorption of atomic H on Cu(110) was studied with LEED, thermal desorption spectroscopy (TDS) and work function change measurements (Δφ) in the temperature range 90–400 K. For production H, molecular hydrogen dosed through a resistivily heated Ta tube onto surface. At source 1325 K H2 dissociation rate > 80%. LEED as well TDS experiments were performed to calibrate coverage θH. From same sticking coefficient S0 at 90 deduced be 0.05 ± 0.04. kinetics reconstruction reaction (1 × 3)H → 2)H constant θH temperatures between 100–200 de-reconstruction 1) above 250 simultaneous determined from isothermal Δφ measurements. T 257 283 experimental data can fitted assuming Avrami exponent n = 1.27 an activation energy 1.02 0.07 eV. low (115–140 K) is found much more complex.