Electrode in a discharge produced plasma extreme ultraviolet source

作者: Bryan J. Rice

DOI:

关键词: Extreme ultraviolet lithographyPlasmaElectrodeMaterials scienceRadiationExtreme ultravioletOptics

摘要: An electrode in an extreme ultraviolet (EUV) source of EUV lithography tool. The may be operable to produce a plasma which emits radiation.

参考文章(10)
Glenn D. Kubiak, William C. Sweatt, Radiation source with shaped emission ,(2001)
William N. Partlo, Daniel L. Birx, Igor V. Fomenkov, Plasma focus high energy photon source with blast shield ,(2000)
Horst Seifert, Johannes Wilhelmus Antonius Krol, Bernhard Lersmacher, Method of manufacturing grid electrodes for electron tubes ,(1975)
Neal R. Fornaciari, Richard E. Nygren, Michael A. Ulrickson, Extreme-UV electrical discharge source ,(2000)
Richard A. Stall, Alexander Gurary, Craig R. Nelson, Gary S. Tompa, Apparatus for depositing a coating on a substrate ,(1991)
Robert Grill, Nikolaus Reheis, Michael Witwer, Heavily thermally stressable component ,(1994)
David Sydney Widmer, Arthur Stanley C, Tube cell for atomic absorption spectrophotometry ,(1984)
Macrae Barclay John, Martin Ettington, Heat exchange apparatus ,(1942)