作者: Bekir Sami Yilbas , Billel Salhi , Muhammad Rizwan Yousaf , Fahad Al-Sulaiman , Haider Ali
DOI: 10.1038/SREP38678
关键词: Coating 、 Isotropic etching 、 Contact angle 、 Layer (electronics) 、 Chemical engineering 、 Wafer 、 Nanowire 、 Materials science 、 Wetting 、 Octadecyltrichlorosilane
摘要: In this study, nanowires/nanowalls were generated on a silicon wafer through chemical etching method. Octadecyltrichlorosilane (OTS) was deposited onto the nanowire/nanowall surfaces to alter their hydrophobicity. The hydrophobic characteristics of further modified via 1.5-μm-thick layer n-octadecane coating OTS-deposited surface. resulting assessed using sessile water droplet Scratch and ultraviolet (UV)-visible reflectivity tests conducted measure friction coefficient surfaces. nanowires formed normal surface uniformly extended 10.5 μm OTS enhanced state surface, contact angle increased from 27° 165°. altered This study provides first demonstration that wetting change hydrophilic after melting coating. addition, is reversible; i.e., becomes solidifies at process again occurs in opposite direction melts.