Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT
作者： N. T. Goodfriend , S. V. Starinskiy , O. A. Nerushev , N. M. Bulgakova , A. V. Bulgakov
DOI: 10.1007/S00339-016-9666-X
关键词: Thermal expansion 、 Titanium 、 Deformation (engineering) 、 Laser 、 Sapphire 、 Plasma 、 Optoelectronics 、 Optical microscope 、 Optics 、 Thin film 、 Materials science
摘要: The influence of the laser pulse duration on mechanism blister formation in particle transfer technique, blister-based laser-induced forward transfer, was investigated. Pulses from a fs Ti:Sapphire (120 fs, 800 nm) and ns Nd:YAG (7 ns, 532 were used to directly compare thin titanium films ca. 300 nm thickness, deposited glass. different morphologies compared contrasted by using optical microscopy atomic force microscopy. results provide evidence for mechanisms: pulses is predominantly ablation at metal–glass interface accompanied confined plasma expansion deformation remaining metal film; it heating thermal film.
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