Wafer carrier rinsing mechanism
作者： Paul A. Manfredi , Thomas J. Martin , Douglas P. Nadeau , Cuc Kim Huynh , Joseph M. Weatherwax
DOI:
关键词: Leading edge 、 Electronic engineering 、 Trailing edge 、 Optoelectronics 、 Mechanism (engineering) 、 Nozzle 、 Edge (geometry) 、 Materials science 、 Wafer
摘要: A carrier rinse unit comprising a plurality of nozzles prepositioned to eject cleaning fluid against surface wafer while the is rotated within carrier. The may be angled spray leading edge, trailing an outer edge wafer, or any desired point on wafer.
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